UNITED STATES PATENT AND TRADEMARK OFFICE
`_____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`_____________
`
`ASML NETHERLANDS B.V., EXCELITAS TECHNOLOGIES CORP., AND
`QIOPTIQ PHOTONICS GMBH & CO. KG,
`Petitioner,
`
`v.
`
`ENERGETIQ TECHNOLOGY, INC.,
`Patent Owner.
`_____________
`
`Case IPR2015-01362
`Patent 8,969,841
`_____________
`
`
`
`
`MAIL STOP PATENT BOARD
`Patent Trial and Appeal Board
`United States Patent and Trademark Office
`Post Office Box 1450
`Alexandria, Virginia 22313-1450
`
`
`ENERGETIQ TECHNOLOGY, INC.’S MOTION FOR
`PRO HAC VICE ADMISSION OF FABIO E. TARUD
`
`
`
`
`
`
`_____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`_____________
`
`ASML NETHERLANDS B.V., EXCELITAS TECHNOLOGIES CORP., AND
`QIOPTIQ PHOTONICS GMBH & CO. KG,
`Petitioner,
`
`v.
`
`ENERGETIQ TECHNOLOGY, INC.,
`Patent Owner.
`_____________
`
`Case IPR2015-01362
`Patent 8,969,841
`_____________
`
`
`
`
`MAIL STOP PATENT BOARD
`Patent Trial and Appeal Board
`United States Patent and Trademark Office
`Post Office Box 1450
`Alexandria, Virginia 22313-1450
`
`
`ENERGETIQ TECHNOLOGY, INC.’S MOTION FOR
`PRO HAC VICE ADMISSION OF FABIO E. TARUD
`
`
`
`
`
`
`
`
`
`I.
`
`Statement of Precise Relief Requested
`
`Pursuant to 37 C.F.R. § 42.10, Patent Owner Energetiq Technology, Inc.
`
`(“Energetiq”) requests that the Board admit Fabio E. Tarud pro hac vice in this
`
`proceeding.
`
`II. Good Cause Exists for the Board to Recognize Counsel Pro Hac Vice
`During the Proceeding
`
`In accordance with 37 C.F.R. § 42.10(c), the Board may recognize counsel
`
`pro hac vice during a proceeding upon a showing of good cause, subject to the
`
`condition that lead counsel be a registered practitioner and to any other conditions
`
`as the Board may impose. More specifically, 37 C.F.R. § 42.10(c) indicates that
`
`“where the lead counsel is a registered practitioner, a motion to appear pro hac vice
`
`by counsel who is not a registered practitioner may be granted upon showing that
`
`counsel is an experienced litigating attorney and has an established familiarity with
`
`the subject matter at issue in the proceeding.” The facts here establish good cause
`
`for the Board to recognize Fabio E. Tarud pro hac vice during this proceeding.
`
`Lead Counsel, Steven M. Bauer, is a registered practitioner, having USPTO
`
`Registration No. 31,481.
`
`Counsel, Fabio E. Tarud, is an experienced patent litigator and has an
`
`established familiarity with the subject matter at issue in the proceeding.
`
`Accompanying this motion is the Declaration of Fabio E. Tarud in Support of
`
`Motion for Admission Pro Hac Vice (Ex. 2075). Mr. Tarud is a litigating attorney
`
`
`
`2
`
`
`
`
`
`with over 5 years of patent litigation experience. Ex. 2075 at ¶¶ 9-10. He is a
`
`member in good standing with the Bar of the State of New York. Id. at ¶ 2. He
`
`has never been suspended, disbarred, sanctioned, denied admission to practice, or
`
`cited for contempt by any court or administrative body. Id. at ¶¶ 3-5. Mr. Tarud is
`
`familiar with the subject matter at issue, and his technical experience will aid
`
`Energetiq in this proceeding. Id. at ¶ 11. He also satisfies the remaining
`
`conditions for admissibility identified by the Board. See Id. at ¶¶ 6-8.
`
`III. Conclusion
`For the foregoing reasons, Energetiq respectfully requests that the Board
`
`admit Fabio E. Tarud pro hac vice in this proceeding.
`
`
`
`
`
`
`Respectfully submitted,
`Proskauer Rose LLP
`
`
`
`
`
`
`/ Steven M. Bauer /
`
`
`Steven M. Bauer, Reg. No. 31,481
`Attorney for Patent Owner
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`Date: April 1, 2016
`PROSKAUER ROSE LLP
`One International Place
`Boston, Massachusetts 02110
`
`
`
`3
`
`
`
`
`
`
`
`
`
`
`
`
`
`Exhibit #
`
`PATENT OWNER’S EXHIBIT LIST
`
`Document
`
`2001
`
`2002
`
`Declaration of Safraz W. Ishmael in Support of Motion for
`Admission Pro Hac Vice
`Cremers et al., “Evaluation of the continuous optical discharge
`for spectrochemical analysis,” Spectrochimica Acta, Vol. 40B,
`No. 4, pp. 665-679 (1985) (“Cremers”)
`Declaration of Jinnie L. Reed in Support of Motion for
`Admission Pro Hac Vice
`2003
`2004 <Reserved>
`2005 Images, ASML's Customer Magazine, (2014)
`2006 J. Gary Eden Dep. Transcript Excerpts
`2007 Raizer, Gas Discharge Physics, pp. 35-51, 306-310 (1st ed. 1991)
`“A Novel Electrodeless Light Source for Wafer Inspection
`Applications,” (January 4, 2006)
`PROTECTIVE ORDER MATERIAL
`“Photon Source, Metrology Apparatus, Lithographic System and
`Device Manufacturing Method,” U.S. Pub. No. US 2013/0329204
`A1 (December 12, 2013)
`Bucksbaum Declaration
`PROTECTIVE ORDER MATERIAL
`Raizer, Gas Discharge Physics, pp. 35-51, 306-310 (Corrected
`2nd Printing 1997)
`
`2008
`
`2009
`
`2010
`
`2011
`
`2013
`
`2014
`
`2012 Eden’s ECE 523 Syllabus (Spring 2016)
`Zimakov et al., "Interaction of Near-IR Laser Radiation with
`Plasma of a Continuous Optical Discharge," Plasma Physics
`Reports, Vol. 42, No. 1 (2016)
`Bezel et al, “High Power Laser-Sustained Plasma Light Sources
`for KLA-Tencor Broadband Inspection Tools” (undated)
`“LDLS™ Laser-Driven Light Source EQ-1000 High Brightness
`DUV Light Source” (2008) (“LDLS Advertisement”)
`Smith Declaration
`PROTECTIVE ORDER MATERIAL
`
`2015
`
`2016
`
`1
`
`
`
`
`
`
`
`
`
`PATENT OWNER’S EXHIBIT LIST
`
`Exhibit #
`
`Document
`
`Letter from Semrock, Inc. to R&D 100 Awards, dated February
`28, 2011
`M. Rose, "Winners of 2010 Prism Awards Announced", January
`27, 2011, http://www.photonics.com/Article.aspx?AID=45757
`(Accessed January 15, 2015)
`R&D Magazine, "2011 R&D 100 Winner,"
`http://www.rdmag.com/awardwinners/2011/08/lightsourcelifetim
`eliftedlasertech (Accessed January 7, 2016)
`Rudoy et al., "Xenon Plasma Sustained by Pulse-Periodic Laser
`Radiation," Plasma Physics Reports Vol. 41, No. 10 (2015)
`(“Rudoy”)
`Eden Depo Ex. 5 (Knecht et al., “Optical pumping of the XeF(C-
`+A) and iodine 1.315-μm lasers by a compact surface discharge
`system,” Optical Engineering, Vol. 42, No. 12 (2003))
`Fridman et al., Plasma Physics and Engineering, pp. 404-419,
`618-619 (1st ed. 2004)
`Webster’s Third New International Dictionary of the English
`Language, Unabridged , “Sustain,” p. 2304 (2002)
`
`2017
`
`2018
`
`2019
`
`2020
`
`2021
`
`2022
`
`2023
`
`2024 Merriam-Webster Dictionary, “Sustain,” pp. 722-23 (2004)
`The American Heritage Dictionary of the English Language,
`“Sustain,” p. 1744 (4th ed. 2006)
`
`2025
`
`2027
`
`2028
`
`2026 Curriculum vitae of Donald K. Smith
`“Light Source Proposal…” (12/15/2005)
`PROTECTIVE ORDER MATERIAL
`2007 ASML/Energetiq Email
`PROTECTIVE ORDER MATERIAL
`Zimakov et al., "Bistable behavior of a continuous optical
`discharge as a laser beam propagation effect" (2013)
`Project Agreement for Feasibility Study (May 3, 2006)
`PROTECTIVE ORDER MATERIAL
`
`2029
`
`2030
`
`
`
`2
`
`
`
`
`
`
`
`
`
`PATENT OWNER’S EXHIBIT LIST
`
`Exhibit #
`
`Document
`
`Claim Chart comparing Energetiq’s Laser-Driven Light Source
`Products to U.S. Patent No. 9,048,000 & 8,969,841
`“Energetiq Announces Ultra-Compact Light Source for Next
`Generation HPLC and Advanced Microscopy,” (January 21,
`2010)
`“Operation and Maintenance Manual, Model EQ-99, LDLS Laser
`Driven Light Source,” Rev. 2 (March 2012)
`
`2031
`
`2032
`
`2033
`
`2035
`
`2036
`
`2037
`
`2038
`
`2039
`
`2040
`
`2041
`
`2042
`
`2034 Infringement Chart for ’000 Patent & ’841 Patent
`Letter from R&D Magazine to Energetiq Technology, Inc. (June
`15, 2011)
`Presentation to ASML, “LDLS Laser Driven Light Sources for i-
`Line” (10/25/2007)
`PROTECTIVE ORDER MATERIAL
`Presentation to ASML, “Next Generation LDLS UV Lamp for
`ASML” (2/12/2008)
`PROTECTIVE ORDER MATERIAL
`Martin van den Brink,“Many Ways to Shrink: The right moves to
`10 nanometer and beyond,” ASML, dated November 24, 2014
`RnD-ISAN LLC, “Laser Pumped Plasma Broadband Light
`Source”
`2007 Energetiq License Agreement
`PROTECTIVE ORDER MATERIAL
`2010 Energetiq License Agreement
`PROTECTIVE ORDER MATERIAL
`Email from Energetiq to ASML
`PROTECTIVE ORDER MATERIAL
`Email from Qioptiq to Energetiq dated September 29, 2014
`PROTECTIVE ORDER MATERIAL
`
`2043
`
`2044 Product Launch Document
`
`
`
`3
`
`
`
`
`
`
`
`
`
`PATENT OWNER’S EXHIBIT LIST
`
`Exhibit #
`
`Document
`
`I.N. Toumanov, “General Analysis of Plasma Technique in
`Chemical Technology and Metallurgy,” Plasma and High
`Frequency Processes for Obtaining and Processing Materials in
`the Nuclear Fuel Cycle, p. 60 (2003)
`Fridman et al., Plasma Physics and Engineering, pp. 409-424,
`639-40 (2nd ed. 2011)
`
`2045
`
`2046
`
`2048
`
`2047 Laser Focus, p. 108 (Dec. 1985)
`Tidwell et al., "Highly efficient 60-W TEM00 cw diode-end-
`pumped Nd:YAG laser," Optics Letters, Vol. 18, No. 2, (1993)
`Shine et al., "40-W cw, TEM00-mode, diode-laser-pumped,
`Nd:YAG miniature-slab laser," Optics Letters, Vol. 20, No. 5,
`(1995)
`Schöne et al., "Diode-Pumped High-Power cw Nd:YAG Lasers,"
`Laser in Forschung und Technik (1996)
`
`2049
`
`2050
`
`2054
`
`2055
`
`2056
`
`2051 Optics & Photonics News, January 1999
`2052 YieldStar T-250D Product Brochure, dated January 20, 2014
`2053 YieldStar S-250D Product Brochure, dated January 20, 2014
`Operation Manual, LDLS Laser-Driven Light Source, EQ-1000
`High Brightness DUV Light Source, Rev. 5 (Aug. 2009)
`Operation Manual, Model EQ-1500, LDLS Laser-Driven Light
`Source, Rev. 4 (May 2011)
`Operation and Maintenance Manual, Model EQ-77, LDLS Laser-
`Driven Light Source, Rev. 2 (Dec. 2015)
`Operation and Maintenance Manual, Model EQ-90-FC, LDLS
`Laser-Driven Light Source, Rev. 1 (Jan. 2014)
`2057
`2058 Raizer, Optical discharges, Soviet Physics Uspekhi 23(11) (1980)
`Operation and Maintenance Manual, Model EQ-99X, LDLS
`Laser-Driven Light Source, Rev. 1 (Jan. 2014)
`Operation and Maintenance Manual, Model EQ-99-FC, LDLS
`Laser-Driven Light Source, Rev. 2 (March 2012)
`Operation and Maintenance Manual, Model EQ-99X-FC, LDLS
`Laser-Driven Light Source, Rev. 1 (Jan. 2014)
`4
`
`2059
`
`2060
`
`2061
`
`
`
`
`
`
`
`
`
`
`
`PATENT OWNER’S EXHIBIT LIST
`
`Exhibit #
`
`Document
`
`2065
`
`2069
`
`2070
`
`Operation and Maintenance Manual, Model EQ-9-N, LDLS
`Laser-Driven Light Source, Rev. 6 (Sept. 2015)
`2062
`2063 EQ-400 LDLS Laser-Driven Light Source
`2064 Energetiq Laser-Driven Light Sources
`ASML BV LDLS Roadmap (6/11/2013)
`PROTECTIVE ORDER MATERIAL
`Nanometrics, Organic Growth Opportunities for Nanometrics in
`Process Control
`2066
`2067 “LDLS Laser-Driven Light Source” (07/08/2011)
`2068 <Reserved>
`Castellano, “Are the Brains At ASML Hurting Investors With
`High And Ambitious R&D Costs?” July 20, 2015,
`Norton et al., “Broadband Microspectro-Reflectometer,” U.S.
`Patent No. 5,747,813 (May 5, 1998)
`Haverlag et al., “Optical Inspection System and Radiation Source
`for Use Therein,” U.S. Pub. No. US 2006/0109455 A1 (May 25,
`2006)
`M. W. P. Cann, Light Sources in the 0.15-20-μ Spectral Range,
`Vol. 8 No. 8 Applied Optics (1969)
`Solarz, “Coherent DUV Illumination for Semiconductor Wafer
`Inspection,” U.S. Patent No. 7,295,739 (Nov. 13, 2007)
`2073
`2074 Curriculum Vitae of Philip H. Bucksbaum
`Declaration of Fabio E. Tarud in Support of Motion for
`Admission Pro Hac Vice
`
`
`
`2071
`
`2072
`
`2075
`
`
`
`5
`
`
`
`CERTIFICATE OF SERVICE
`
`
`
`Respectfully submitted,
`Proskauer Rose LLP
`
`/ Gerald E. Worth /
`Gerald E. Worth, Reg. No. 45, 238
`Attorney for Patent Owner
`
`
`
`
`
`
`
`
`
`I hereby certify that on this 1st day of April, 2016 copies of this Motion for
`Pro Hac Vice Admission of Fabio E. Tarud, the Declaration of Fabio E. Tarud in
`Support of Motion for Admission Pro Hac Vice, and Exhibit list are being served
`pursuant to 37 C.F.R. § 42.6 electronically (by consent of the parties) on the
`following email addresses for Petitioner:
`
`Don.Steinberg@wilmerhale.com
`David.Cavanaugh@wilmerhale.com
`MichaelH.Smith@wilmerhale.com
`
`
`
`
`
`
`
`
`
`
`Date: April 1, 2016
`PROSKAUER ROSE LLP
`One International Place
`Boston, Massachusetts 02110
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