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Page 1 of 12
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`Attorney Docket No. EGQ-005CP3
`
`PATENT
`
`APPLICANTS:
`
`Smith, Donald et al.
`
`CONFIRMATION NO.:
`
`9849
`
`APPLICATION NO.:
`
`13/024,027
`
`GROUP NO.:
`
`2881
`
`FILING DATE:
`
`February 9, 2011
`
`EXAMINER 2
`
`McCormack, Jason
`
`TITLE:
`
`LASER—DRIVEN LIGHT SOURCE
`
`Commissioner for Patents
`
`P.O. Box 1450
`
`Alexandria, VA 22313-1450
`
`RESPONSE TO NON-FINAL OFFICE ACTION
`
`This paper is submitted in response to the Non-Final Office Action mailed from the
`
`Patent Office on July 10, 2012 (“Office Action”). Applicants hereby request a one—month
`
`extension of time, extending the due date for response to Monday, November 12, 2012. The
`
`Commissioner is hereby authorized to charge the fee for the extension of time to Attorney’s
`
`Deposit Account No. 50-3081. In the event any additional fees are due, the Commissioner is
`
`hereby authorized to charge them to Attorney’s Deposit Account No. 50-3081.
`
`Applicant respectfully requests entry of this Response, in Which:
`
`Applicants’ Remarks begin on page 2.
`
`ASML 1119
`
`

`
`Response to Non—Fina1 Office Action
`Application No.: 13/024,027
`Page 2 of 12
`
`REMARKS
`
`Claims 1-55 are currently pending. Claims 1-8 are elected and presented for
`
`consideration. Claims 9-55 were previously withdrawn from consideration in response to the
`
`Restriction Requirement of April 26, 2012.
`
`In view of the following remarks, Applicants respectfully request reconsideration and
`
`withdrawal of all grounds of objection and rejection.
`
`1. Re'ections under 35 U.S.C.
`
`112
`
`The Office Action objects to claim 1 under 35 U.S.C. § 112 as being indefinite for failing
`
`to particularly point out and distinctly claim the subject matter which Applicants regard as the
`
`invention. The Office Action states that the term “high” in the phrase “high brightness light
`
`source” is a relative term which renders the claim indefinite. Applicants respectfully disagree.
`
`Applicants submit that one of ordinary skill in the art would reasonably understand the
`
`term “high” in the phrase “high brightness light source” in view of Applicants’ specification. For
`
`example, paragraphs [0003] — [0005] of Applicants’ published application no. 2011/0181191
`
`(the “Present Application”) state “xenon or mercury arc lamps” are examples of “high
`
`brightness” light sources and that the present application improves upon these lamps in creating
`
`“high brightness light sources.” See Present Application at W [0003] — [0005]. Moreover,
`
`Applicants further submit that one of ordinary skill in the art would reasonably understand the
`
`term “high” in the phrase “high brightness light source” by virtue of Applicants’ recited uses, for
`
`example, the light sources can be “used for inspection, testing or measuring properties associated
`
`with semiconductor wafers or materials used in the fabrication of wafers (e. g., reticles and
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 3 of 12
`
`photomasks).” See Present Application at 1] [0003]. The high brightness light sources of the
`
`Present Application can also be used in, for example, absorption cells, ultra-violet light detectors,
`
`diode array detectors, and fluorescence detectors. See Present Application at W [013 l]-[0l34];
`
`Figures 35-38. The specific parameters of the light “(e.g., wavelength, power level, and
`
`brightness)” vary depending upon the specific application. These application-dependent
`
`parameters are known to those of skill in the art. Applicants also describe high brightness light
`
`as “light in the ultraviolet range” and “light in the visible range” used in arc lamps with solid
`
`material bulbs “. .
`
`. capable of sustaining high pressures and temperatures.” See Present
`
`Application at ‘W [001 l], [0089], [0l8l], [0l43], and [00148],
`
`Applicants’ descriptions of the phrase “high brightness light” throughout the Present
`
`Application provide context for one skilled in the art to be reasonably apprised on the scope of
`
`the invention. Based on the Present Application, Applicants respectfully submit that the term
`
`“high” in the phrase “high brightness light” is not indefinite. Accordingly, Applicants
`
`respectfully request reconsideration and withdrawal of the objection to claim 1.
`
`2. Rejections under 35 U.S.C. § 102
`
`The Office Action rejects claims 1-8 under 35 U.S.C. § 102 as allegedly being anticipated
`
`by U.S. Publication No. 2006/03 9435 to Cheymol (“Cheymol”) and separately rejects claims l-8
`
`under 35 U.S.C. § 102 as allegedly being anticipated by U.S. Publication No. 2002/0080834 to
`
`Kusunose (“Kusunose”). Of these, claim 1 is independent. For a rejection under 35 U.S.C. §l02
`
`to be proper, each reference by itself must disclose each and every element in the claim.
`
`

`
`Response to Non—Final Office Action
`Application No.: 13/024,027
`Page 4 of 12
`
`Applicants respectfully submit that neither Cheymol nor Kusunose disclose each and every
`
`element of Applicants’ claims.
`
`a. Re'ections under 35 U.S.C.
`
`102 — Chevmol
`
`Applicants respectfully submit that Cheymol does not disclose each and every element of
`
`Applicants’ claims, at least because Cheymol fails to disclose each of the following elements of
`
`Applicants’ independent claim 1:
`
`(l)
`
`(2)
`
`“a chamber having a gas disposed therein .
`light,” and
`
`.
`
`. to produce a high brightness
`
`an “ignition source for exciting the gas, the excited gas having at least one
`strong absorption line at an infrared wavelengt
`.”
`
`Applicants’ invention features a “light source for generating a high brightness light.”
`
`Present Application at 1] [OOO8]. The light source is started by making the “absorption of the
`
`laser light by the gas within the chamber ... strong enough to provide sufficient energy to the gas
`
`to form a dense plasma. Id. at ll [O232]. “However, during operation, the same absorption that
`
`was used to start the [laser-driven light source] LDLS can be too strong to maintain the
`
`brightness of the light.” ld. This can create an imbalance between the “absorption needed to
`
`start a LDLS and the absorption needed to maintain or operate the LDLS.” Id.
`
`To correct the imbalance, the light source of the present invention has a “laser [that] is
`
`first tuned to a wavelength nearer the absorption line and then tuned to another wavelength
`
`further away from the strong absorption line for optimum operation.” Present Application at
`
`1] [0232]. “The light source can use an excited gas that has at least one strong absorption line at
`
`an infrared wavelength to produce a high brightness light,” for example, xenon. Id. at 11 [023 3].
`
`“An ignition source 140 can be used to excite the gas within the chamber.” Id. “The excited gas
`
`

`
`Response to Non—Final Office Action
`Application N0.: 13/024,027
`Page 5 of 12
`
`has electrons at an energy level that is higher than the energy of the gas at its ground state.” Id.
`
`“The excited gas has at least one strong absorption line at an infrared wavelength, for example at
`
`about 980 nm, 895 nm, 882 nm, or 823 nm.” Id. A laser can then provide energy “to the excited
`
`gas within the chamber 128 to produce a high brightness light.” Id.
`
`(1) “a chamber having a gas disposed therein .
`brightness light”
`
`.
`
`. to produce a high
`
`Cheymol fails to disclose “a chamber having a gas disposed therein .
`
`.
`
`. to produce a high
`
`brightness light” as recited in Applicants’ independent claim 1. In contrast to the high brightness
`
`light (e.g., light in the ultraviolet and visible ranges) of Applicants’ invention, Cheymol describes
`
`light sources of extreme ultraviolet, i.e. EUV, which are very short wavelengths at high energy
`
`radiation. Specifically, Cheymol describes a device for “. .
`
`. generating light in the extreme
`
`ultraviolet, and to its application to a source for lithography using radiation in the extreme
`
`ultraviolet .
`
`.
`
`.
`
`. also referred to more simply as ‘EUV’ radiation.” See Cheymol at 1] [0001]-
`
`[0002] (italics added); see also id. at [0013]. Cheymol’s light source seeks to “. .
`
`. enable a
`
`plurality of laser beams to be used simultaneously to increase strongly the incident laser power
`
`while conserving a device that is effective in collecting EUV radiation .
`
`.
`
`.
`
`. Id. at fll [0014]
`
`(italics added.; The EUV wavelength typically covers the “. .
`
`. radiation in the extreme
`
`ultraviolet domain .
`
`.
`
`. wavelengths lying in the range 1 nanometer (mn) to 15 mn .
`
`.
`
`. .”. Id. at
`
`ll [0002]. The EUV light of Cheymol is not the high brightness light of Applicants’ invention.
`
`In View of the foregoing, Applicants respectfully submit that Cheymol fails to disclose
`
`each and every element of Applicants’ independent claim 1, at least because Cheymol fails to
`
`disclose “a chamber having a gas disposed therein .
`
`.
`
`. to produce a high brightness light.”
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 6 of 12
`
`Therefore, Applicants’ respectfully request reconsideration and withdraw of the rejection of this
`
`claim under 35 U.S.C. § 102 in view of Cheymol. Furthermore, Applicants respectfully submit
`
`that claims 2-8 are also allowable as each depends from an allowable independent claim.
`
`(2) an “ignition source for exciting the gas, the excited gas having at least
`one strong absorption line at an infrared wavelengt ”
`
`Cheymol also fails to describe an “ignition source for exciting the gas, the excited gas
`
`having at least one strong absorption line at an infrared wavelength” as recited in Applicants’
`
`independent claim 1. Applicants’ invention uses an ignition source for exciting a gas. The
`
`excited gas has “. .
`
`. at least one strong absorption line at an infrared wavelength .
`
`.
`
`. .” See
`
`Present Application at claim 1. Noble gases, such as xenon, “can be transparent in the visible
`
`and near infrared range of the spectrum, but this is not the case when the gas is at high
`
`temperature or in the presence of excited molecular states, such as excimers.” Id. at 1] [0237]. A
`
`gas like xenon in an excited state, even its lowest excited state, results in “the appearance of
`
`strong absorption lines due to transitions between the relatively high energy state and any of the
`
`several higher level states.” Id. at W [023 7]-[023 8]. When an electron moves between two
`
`levels, a photon can be emitted or absorbed, e.g. a 980 nm photon.” Id. An example of an
`
`absorption line in xenon is “about 980 rim and about 882 nm .
`
`.
`
`. .” Id. atjl [023 9]. Such
`
`absorption lines do not exist in the unexcited gas. See id. at 1] [0240].
`
`The light source of Cheymol emits “a plasma emitting radiation in the extreme
`
`ultraviolet.” Cheymol at Abstract. The light source has an injector device “to create a
`
`filamentary jet or a liquid microj et or a jet of individual droplets
`
`constituting a target.” Id. at
`
`jl [0052]. Laser beams are focused onto the target. Id. at 1[ [0053]. The “resulting emission 7
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 7 of 12
`
`can differ depending on whether each individual laser beam illuminates the target 4 sufficiently
`
`to produce EUV, or whether it is only the superposition of a plurality of laser beams that makes it
`
`possible to obtain optimum illumination for EUV emission.” Id. at 1] [U058].
`
`Unlike Applicants’ claimed invention, the light source of Cheymol lacks an ignition
`
`source for exciting a gas. The light source of Cheymol has an injector device to create a “jet” or
`
`“liquid microjet” or “individual droplets,” which are not a gas as recited in Applicants’ claims.
`
`Moreover, Cheymol does not excite a gas using an ignition source. As stated above, the excited
`
`gas of Applicants’ invention has at least one strong absorption line at an infrared wavelength,
`
`which, when ignited, generates a high brightness light at startup. The laser can then be tuned to
`
`another wavelength further away from the strong absorption line for optimum operation.
`
`Therefore, Cheymol lacks an “ignition source for exciting the gas, the excited gas having at least
`
`one strong absorption line at an infrared wavelength” as recited in Applicants’ independent claim
`
`1.
`
`In view of the foregoing, Applicants respectfully submit that Cheymol fails to disclose
`
`each and every element of Applicants’ independent claim 1 at least because Cheymol fails to
`
`disclose an “ignition source for exciting the gas, the excited gas having at least one strong
`
`absorption line at an infrared wavelength.” Therefore, Applicants respectfully request
`
`reconsideration and withdraw of the rejection of this claim under 35 U.S.C. § 102 in view of
`
`Cheymol. Furthermore, Applicants respectfully submit that claims 2-8 are also allowable as each
`
`depends from an allowable independent claim.
`
`b. Re'ecti0ns under 35 U.S.C.
`
`102 — Kusunose
`
`

`
`Response to Non—Final Office Action
`Application No.: 13/024,027
`Page 8 of 12
`
`Applicants respectfully submit that Kusunose does not disclose each and every element of
`
`Applicants’ claims, at least because Kusunose fails to disclose each of the following elements of
`
`Applicants’ independent claim 1:
`
`(1)
`
`“a chamber having a gas disposed therein .
`light,” and
`
`.
`
`. to produce a high brightness
`
`(2)
`
`an “ignition source for exciting the gas, the excited gas having at least one
`
`strong absorption line at an infrared wavelength.”
`
`As discussed above, Applicants’ invention features a “light source for generating a high
`
`brightness light.” Present Application at 1] [OOO8]. To correct the imbalance between the
`
`“absorption needed to start a LDLS and the absorption needed to maintain or operate the LDLS,”
`
`the light source of the present invention has a “laser [that] is first tuned to a wavelength nearer
`
`the absorption line and then tuned to another wavelength further away from the strong absorption
`
`line for optimum operation.” Id. at 1] [O232]. “The light source can use an excited gas that has at
`
`least one strong absorption line at an infrared wavelength to produce a high brightness light,” for
`
`example, xenon.
`
`Id. at 1] [O233]. “The excited gas has electrons at an energy level that is higher
`
`than the energy of the gas at its ground state.” Id. at 1] [023 3]. “The excited gas has at least one
`
`strong absorption line at an infrared wavelength, for example at about 980 nm, 895 nm, 882 nm,
`
`or 823 nm.” Id. A laser can then provide energy “to the excited gas within the chamber 128 to
`
`produce a high brightness light.” Id.
`
`(1) “a chamber having a gas disposed therein .
`brightness light”
`
`.
`
`. to produce a high
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 9 of 12
`
`Kusunose fails to disclose “a chamber having a gas disposed therein .
`
`.
`
`. to produce a high
`
`brightness light” as recited in Applicants’ independent claim 1. In contrast to the high brightness
`
`light (e.g., light in the ultraviolet and visible ranges) of Applicants’ invention, Kusunose
`
`describes EUV light sources, similar to Cheymol, which are very short wavelengths at high
`
`energy radiation. Specifically, Kusunose describes a light source device having a high pulse rate
`
`capable of “emitting a high—Zuminance radiation pulse.” Kusunose at 11 [0001] (italics added);
`
`see also id. at 1] [0021] (“radiation light”). Kusunose’s device generates “.
`
`.
`
`. ultraviolet light or
`
`an X ray having .
`
`.
`
`. a wavelength band of EUV or UVU of which wavelength is about 13 nm. .
`
`.
`
`.
`
`[where] the ultraviolet light or X ray subj ected to wavelength conversion is utilized as useful
`
`radiation light.” Id. at 1] [0027]. The EUV light of Kusunose is not the high brightness light of
`
`Applicants’ invention.
`
`In view of the foregoing, Applicants respectfully submit that Kusunose fails to disclose
`
`each and every element of Applicants’ independent claim 1, at least because Kusunose fails to
`
`disclose “a chamber having a gas disposed therein .
`
`.
`
`. to produce a high brightness light.”
`
`Therefore, Applicants’ respectfully request reconsideration and withdraw of the rejection of this
`
`claim under 35 U.S.C. § 102 in view of Kusunose. Furthermore, Applicants respectfully submit
`
`that claims 2-8 are also allowable as each depends from an allowable independent claim.
`
`(2) an “ignition source for exciting the gas, the excited gas having at least
`one strong absorption line at an infrared wavelength ”
`
`Kusunose also fails to describe an “ignition source for exciting the gas, the excited gas
`
`having at least one strong absorption line at an infrared wavelength” as recited in Applicants’
`
`independent claim 1. As discussed above, Applicants’ invention uses an ignition source for
`
`

`
`Response to Non—Final Office Action
`Application No.: 13/024,027
`Page 10 of 12
`
`exciting a gas. The excited gas has “. .
`
`. at least one strong absorption line at an infrared
`
`wavelength .
`
`.
`
`. .” See Present Application at claim 1. An example of an absorption line in
`
`xenon is “about 980 nm and about 882 nm .
`
`.
`
`. .” ld. atfl [0239]. Such absorption lines do not
`
`exist in the unexcited gas. See id. at 1] [0240].
`
`Unlike Applicants’ claimed invention, the light source of Kusunose lacks an ignition
`
`source for exciting a gas. The light source of Kusunose has “a high pulse rate and [is] capable of
`
`emitting a high-luminance radiation pulse.” Kusunose at 1] [0002]. Multiple light sources (e. g.,
`
`eight) are used along with a “rotating reflection body.” Id. at 1] [0020]. “The radiation light
`
`emitted from each of the light sources
`
`is incident onto a reflection surface 2a of the rotating
`
`reflection body 2.” Id. at 1] [002l]. “The radiation light incident onto the rotating reflection body
`
`2 is reflected by the reflection surface, is emitted along optical path L common to the respective
`
`light sources, and used for the various kinds of processing.” Id. at 1] [0022]. The radiation light
`
`emitted from the light sources and reflected along a path, is not an ignition source for igniting a
`
`gas as recited in Applicants’ independent claim 1.
`
`In view of the foregoing, Applicants respectfully submit that Kusunose fails to disclose
`
`each and every element of Applicants’ independent claim 1 at least because Kusunose fails to
`
`disclose “ignition source for exciting the gas, the excited gas having at least one strong
`
`absorption line at an infrared wavelength.” Therefore, Applicants respectfully request
`
`reconsideration and withdraw of the rejection of this claim under 35 U.S.C. § 102 in view of
`
`Kusunose. Furthermore, Applicants respectfully submit that claims 2-8 are also allowable as
`
`each depends from an allowable independent claim.
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 11 of 12
`
`Dependent claims 6 & 7
`
`Regarding dependent claims 6 and 7, the Office Action states that Radiometric
`
`Characterization of Ultrahigh Radiance Xenon Short—arc Discharge Lamps, Nakar et al.
`
`(“Nakar”) “specifies that the prominent absorption lines of xenon occur at 823, 882, and 992
`
`nm.” See Office Action p. 3. Applicants submit that Nakar also fails to disclose each and every
`
`element of claim 6 or 7 at least because Nakar fails to disclose (1) “a chamber having a gas
`
`disposed therein .
`
`.
`
`. to produce a high brightness light” and (2) an “ignition source for exciting
`
`the gas.
`
`In View of the Applicants respectfully request reconsideration and withdraw of the
`
`rejection of these claims under 35 U.S.C. § 102.
`
`

`
`Response to Non-Final Office Action
`Application No.: 13/024,027
`Page 12 of 12
`
`CONCLUSION
`
`Applicants request that the Examiner reconsider the application and claims in light of the
`
`foregoing remarks, and respectfully submits that the claims are in condition for allowance. The
`
`Examiner is invited to call the undersigned at the number below to discuss the application.
`
`Date: November 8, 2012
`Reg. No.: 62,751
`Tel. No.: (617) 526-9870
`Fax No.: (617) 526-9899
`
`Respectfully submitted,
`
`5
`
`fig gag;
`
`Rebecca N. Barne /
`Attorney for the Applicants
`Proskauer Rose LLP
`One International Place
`Boston, MA 02110-2600
`
`2560/26045-O12 current/32682381v5

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