Attorney Docket No. EGQ-UOSCP3
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`PATENT
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`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
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`APPLICANTS:
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`Smith et. at.
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`GROUP NO.:
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`2881
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`APPLICATION NO.:
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`13f024,027
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`EXAMINER:
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`McCormack, Jason L.
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`FILING DATE:
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`February 9, 2011
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`CONF. NO.:
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`9849
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`TITLE:
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`Laser—Driven Light Source
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`Commissioner for Patents
`
`P.O. Box 1450
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`Alexandria, VA 22313-1450
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`Amendment After Final Office Action
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`This paper is submitted under 37 CFR § 1.116 in response to the final Office Action
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`mailed December 12, 2012 in connection with this matter. Applicants also submit herewith a
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`Request for Continued Examination (RCE), a request for Prioritized Examination, and an
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`extension of time. The Commissioner is hereby authorized to charge the fee for these papers,
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`and for any other fees that may be due in connection with this matter, to Attorney Deposit
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`Account No. 50-3081.
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`Applicants respectfully request entry of this paper in which:
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`Amendments to the Claims begin on page 2; and
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`Applicants’ Remarks begin on page 6.
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`Page 1 of 10
`Page 1 of 10
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`ASML 1212
`ASML 1212
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`

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`Applicant: Smith cl al.
`U.S.S.N.: l3l"024.027'
`
`Filed: I-‘cbnmry 9, 20l l
`Page 2 of 10
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`AMENDMENTS TO THE CLAIMS
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`Please amend the pending claims as follows. This listing of claims will replace all prior versions
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`and listings of claims in the application:
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`Listing of the claims:
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`I. (currently amended) A light source comprising:
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`a cha1nber having a gas disposed therein;
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`an ignition source com_Qrising electrodes for exciting the gas, the excited gas having at
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`least one strong absorption line at an infrared wavelength; -ttfiti
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`‘L:
` at least one laser
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`__‘__c_>_gijg31__1;eg1__tgp1'5)_y'_id_e_ene1'gy to the excited gas at a
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`wavelength -tit?-f:‘:¥--Wltllill EU ram ofa strong absorption l_ine of the excited gas within the chamber
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` 3 at least substantiali wontinuous to sustain a plasma and produce Ill‘ '.' '
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`
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` iasn1a—
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`generated light.
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`2. (original) The light source of claim 1 wherein the gas comprises a noble gas.
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`3. (original) The light source of claim 1 wherein the gas comprises xenon.
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`4. (original) The light source of claim 1 wherein the excited gas comprises atoms at a lowest
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`excited state.
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`5. (original) The light source of claim 1 wherein the gas is absorptive near the wavelength of the
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`at least one laser.
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`6. (original) The light source of claim 1 wherein the strong absorption line of the excited gas is
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`about 980 nm.
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`T. (original) The light source of claim 1 wherein the strong absorption line of the excited gas is
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`about 882 nm.
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`8. (original) The light source of claim 1 wherein the excited gas is in a metastable state.
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`9-55. (canceled)
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`

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`Applicant: Smith cl al.
`U.S.S.N.: 131024.027
`
`Filed: l-‘ebmary 9, 20l l
`Page 3 of 10
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`56. (new) The light source of claim 1 further comprising a means for tuning the wavelength of
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`the laser to within 10 nm away f1'om the absorption line of the excited gas, to increase a
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`radiance of the plasma- generated light.
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`57. (new) The light source of claim 1 wherein a power of the laser is about 10 or 30 or 50 or 60
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`or 100 or 200 watts.
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`58. (new) A method for producing light comprising:
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`providing a light source comprising
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`a pressurized chamber having a gas disposed therein;
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`an ignition source comprising electrodes for exciting the gas, the excited gas
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`having at least one strong absorption line at an infrared wavelength; and
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`at least one lase1' for providing configured to provide energy to the excited gas at a
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`wavelength near within 10 nm ofa strong absorption line of the excited
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`gas within the chamber to sustain a plasma and produce a high brightness
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`at least substantially continuous, plasma—gene1'ated light;
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`exciting with the ignition source the gas within the chamber;
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`tuning the lase1' to a first wavelength to provide energy to the excited gas in the chamber
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`to produce the high brightness light, the excited gas absorbing energy near the first wavelength;
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`and
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`tuning the lase1' to a second wavelength to provide energy to the excited gas in the
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`chamber to maintain the high brightness light, the excited gas absorbing energy near the second
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`wavelength.
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`59. (new) The method of claim 58 wherein tuning the laser to the first and second wavelengths
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`comprises adjusting the operating temperature of the laser.
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`60. (new) The method of claim 59 wherein the laser is a diode laser and the laser is tuned
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`approximately 0.4 nm per degree Celsius of temperature adjustment.
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`61. (new) The method of claim 59 wherein the operating temperature of the laser can be adjusted
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`by varying a current of a thermoelectric cooling device.
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`

`
`Applicant: Smith cl al.
`U.S.S.N.: l3J'024.027
`
`Filed: l-‘ebmary 9, 20l l
`Page 4 of 10
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`62. (new) The method of claim 58 wherein the gas within the chamber has atoms with electrons
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`in at least one excited atomic state.
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`63. (new) The method of claim 58 wherein the gas within the chamber is xenon.
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`64. (new) The method of claim 63 wherein the first wavelength is approximately 930 nm.
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`65. (new) The method of claim 63 wherein the second wavelength is approximately 975 nm.
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`66. (new) The method of claim 58 wherein the second wavelength is approximately 1 nm to
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`approximately 10 nm displaced from the first wavelength.
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`6?. (new) A light source comprising:
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`a pressurized chamber having a gas disposed therein;
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`an ignition source comprising electrodes for exciting the gas, the excited gas having at
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`least one strong absorption line at an infrared wavelength; and
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`at least one laser for providing configured to provide energy to the excited gas at a
`
`wavelength near within 10 nm ofa strong absorption line of the excited gas within
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`the chamber to sustain a plasma and produce a high brightness at least
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`substantially continuous, plasma—gene1'ated light,
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`wherein the chamber has one or more walls and the at least one laser provides energy to
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`the gas within the chamber to produce a plasma that generates a light emitted
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`through the walls of the chamber, the light source further comprising:
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`a dichroic mirror positioned within a path of the at least one laser such that the laser
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`energy is directed toward the plasma, the dichroic mirror selectively reflecting at least one
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`wavelength of light such that the light generated by the plasma is not substantially reflected
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`toward the at least one laser.
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`68. (new) A light source comprising:
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`a pressurized chamber having a gas disposed therein;
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`an ignition source comprising electrodes for exciting the gas, the excited gas having at
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`least one strong absorption line at an infrared wavelength; and
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`

`
`Applicant: Smith cl al.
`U.S.S.N.: l3r"024.027'
`
`Filcd: I-‘cbmary 9, 20l l
`Page 5 of 10
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`at least one lase1' for providing configured to provide energy to the excited gas at a
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`wavelength near within 10 nm of a strong absorption line of the excited gas within
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`the chamber to sustain a plasma and produce a high brightness at least
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`substantially continuous, plasrna—generated light,
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`the at least one laser provides energy to the excited gas within the chamber to produce the
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`high brightness l_ight having a first spectrum, the light source further comprising:
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`an optical element disposed within the path of the high brightness light to modify the first
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`spectrum of the high brightness light to a second spectrum.
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`69. (new) The light source of claim 63 wherein the optical element is a prism.
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`70. (new) The light source of claim 63 wherein the optical element is a weak lens.
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`71. (new) The light source of claim 63 wherein the optical element is a strong lens.
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`72. (new) The light source of claim 68 wherein the optical element is a dichroic filter.
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`73. (new) The light source of claim 68 wherein the second spectrum has a greater intensity of
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`light in the ultraviolet range than the first spectrum.
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`74. (new) The light source of claim 68 wherein the first spectrum has a greater intensity of light
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`in the visible range than the second spectrum.
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`

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`Applicant: Smith cl al.
`U.S.S.N.: 131024.027
`
`Filed: licbruary 9, 20l l
`Page 6 of 10
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`Interview summ.«:m’
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`REMARKS
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`The undersigned wishes to thank the Examiner for his time and the professional courtesy
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`extended during the telephonic interview held on March 13, 2013. The following is intended to
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`constitute a proper recordation of such interview in accordance with MPEP 713.04. A common
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`understanding was reached on many elements of the invention, and Applicant’s representative is
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`grateful for the many helpful suggestions offered by the Examiner. As suggested by the
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`Examiner during the interview, the Applicant has made amendments and provided remarks
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`clarifying the differences between Applicant’s claims and the cited references. Amendments
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`have been made to the claims further explaining that the chamber is pressurized, that the
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`wavelength is within 10 nm of the strong absorption line and that the source produces at least
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`substantially continuous plasma—generated light. Applicant agreed to submit these amendments
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`with an RCE (filed herewith), and the Examiner agreed to consider these amendments and
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`remarks in the context of the rejections presented in the Office Action.
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`Status 0! the clctims
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`Claims 1-55 were pending in the application. Of these, claims 9-55 were withdrawn from
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`consideration. This paper amends claim 1, cancels claims 9-55, and adds new claims 56-74.
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`Support for the new claims can be found in paragraphs 0069, 0138, 015?, 0158, 0231, 0232,
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`0243-0245, 0248, and 0249. These amendments add no new matter to the application.
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`Rejewion under 35 U.S.C. § H2
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`The Office Action rejects claim 1 stating that Applicants do not define “high brightness
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`light source.” Applicants hereby amend claim l to substitute plasma—generated light for high
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`brightness light, and submit that this rejection is overcome by the amendment.
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`

`
`Applicant: Smith cl al.
`U.S.S.N.: l3:"024,027'
`
`Filcd: l-‘cbmary 9, 20l l
`Page 7 of 10
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`Re 'e(‘t‘i(,v1 0 r'i'm'm.s' I-8 under 35 U.S.C. V I02
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`The Office Action rejects claims 1-8 as being anticipated by U.S. Pub. No. 2006039435
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`(“Cheymol”).
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`Applicants have amended claim 1 to recite that the light has an ignition source that
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`includes electrodes for exciting the gas, the light is generated in a pressurized chamber, and that
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`the laser provides energy at a wavelength within 10 nm of an absorption line of the excited gas to
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`sustain and produce at least substantially continuous, plasma—generated light.
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`Cheymol does not teach or suggest electrodes for exciting the gas, and tThe device of
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`Cheymol requires a chamber under vacuum. See generally, Cheymol [D018], [0023], [U024],
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`[U052], [0072], [0088] and [0095]. More generally, Cheymol describes light sources in the
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`extreme ultraviolet region (EUV), which have very short wavelengths at high energy radiation.
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`See Cheymol at ‘J[ [000l]—[0002] and [U013]. Cheymol’s light source seeks to “. .
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`. enable a
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`plurality of laser beams to be used simultaneously to increase strongly the incident laser power
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`while conserving a device that is effective in collecting EUV radiation .
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`.
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`.
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`.
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`(Cheymol
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`at [00l4].) Cheymol uses pulsed lasers [U024].
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`Cheymol is also silent regarding Applicants’ limitation that the lase1' wavelength is within
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`10 nm of an absorption line of the excited gas. Applicants teach that tuning the laser wavelength
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`away from the absorption line sustains the at least substantially continuous, plasma-gene1'ated
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`light. See, e.g., paragraphs 0232, 0242 and 0243 of the published application. The device of
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`Cheymol is not capable of producing a substantially continuous plasma—generated light. Since
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`Cheymol lacks these features of Applicants’ amended claims, and since neither Cheymol nor any
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`of the cited references teach or suggest these features, Applicants submit that claim 1, and the
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`claims that depend therefrom, are not anticipated by Cheymol.
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`Rejection ofciaims I -8 under 35 U.S.C. § 102
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`The Office Action rejects claims 1-8 as being anticipated by U.S. Pub. No. 2002fO080834
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`(“Kusunose”).
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`

`
`Applicant: Smith cl al.
`U.S.S.N.: 133024.027
`
`Filed: I-‘ebmary 9. 201 1
`Page 8 of 10
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`As noted above, Applicants have amended claim 1 to recite that the light has an ignition
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`source that includes electrodes for exciting the gas, the light is generated in a pressurized
`
`chamber, and that the laser provides energy at a wavelength within 10 nm of an absorption line
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`of the excited gas to sustain and produce at least substantially continuous, plasma generated
`
`light.
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`In contrast, Kusunose also describes EUV light Sources, similar to Cheymol, which are
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`very short wavelengths at high energy radiation. Specifically, Kusunose describes a light source
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`device having a high pulse rate capable of “emitting a high-ium:'nam'e radiation pulse.”
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`Kusunose at ‘][ [0001] (italics added); see also id. at ‘]I [0021] (“radiation light”). Kusunose’s
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`device generates “. .
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`. ultraviolet light or an X ray having .
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`.
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`. a wavelength band of EUV or UVU
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`of which wavelength is about 13 nm. .
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`.
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`. [where] the ultraviolet light or X ray subjected to
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`wavelength conversion is utilized as useful radiation light.” Id. at '][ [0027]. The EUV light of
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`Kusunose is not at least substantially continuous, plasma—generated light of Applicants’
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`invention.
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`Kusunose, when combined with Cheymol, does not cure the deficiencies of Cheymol.
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`Like Cheymol, Kusunose does not teach or suggest electrodes for exciting the gas, and the EUV
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`light sources of Kusunose also require vacuum chambers. See the end of paragraph 0026 of
`
`Kusunose.
`
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`

`
`Applicant: Smith cl al.
`U.S.S.N.: 131024.027
`
`Filed: l-‘cbmary 9, 20l l
`Page 9 of 10
`
`Applicants note that Kusunose is also silent conce1'ning a laser tuned to p1'ovide energy at a
`
`wavelength within 10 nm of an absorption line of the excited gas to sustain and produce the
`
`substantially continuous, plasma-generated light.
`
`Since Kusunose lacks these elements of Applicants’ amended claims, Applicants submit
`
`that for at least these reasons claim 1, and dependent claims 2-8, also are not anticipated by
`
`Kusunose.
`
`The new claims
`
`New independent claims 58, 6?, and 68 are added by this amendment. These claims each
`
`recite the light has an ignition source that includes electrodes for exciting the gas, that the light is
`
`generated in a pressurized chamber, and that the laser provides energy at a wavelength within 10
`
`nm of an absorption line of the excited gas to sustain and produce the plasma-generated light.
`
`Since these elements are lacking from the references, Applicants submit that these new
`
`independent claims, and the claims that depend therefrom, define patentable subject matter.
`
`

`
`Applicant: Smith cl al.
`U.S.S.N.: l3:"024,027'
`
`Filed: l-‘cbnmry 9, 20l l
`Page 10 of 1{)
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`Conclusion
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`Applicants request that the Examiner reconsider the application and claims in light of the
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`foregoing amendments and remarks, and respectfully submit that the claims are in condition for
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`allowance. The Examiner is invited to call the undersigned at the number listed below to discuss
`
`the application.
`
`Date: April 12, 2013
`Reg. No.: 45,238
`
`Tel. No.: (617) 526-9626
`Fax No.: (617) 526-9899
`
`Respectfully submitted,
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`‘Gerald E. Worth, P.E.
`Proskauer Rose LLP
`
`Attorney for the Applicants
`One International Place
`Boston, MA 02110