throbber
Trials@uspto.gov
`571-272-7822
`
`
`
`
`
`Paper No. 8
`Entered: September 11, 2017
`
`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________
`
`MIPOX CORPORATION,
`Petitioner,
`
`v.
`
`INTERNATIONAL TEST SOLUTIONS, INC.,
`Patent Owner.
`____________
`
`Case IPR2017-00938
`Patent 6,777,966 B1
`____________
`
`
`Before JO-ANNE M. KOKOSKI, JEFFREY W. ABRAHAM, and
`JOHN F. HORVATH, Administrative Patent Judges.
`
`HORVATH, Administrative Patent Judge.
`
`
`
`DECISION
`Institution of Inter Partes Review
`37 C.F.R. § 42.108
`
`
`
`
`
`

`

`IPR2017-00938
`Patent 6,777,966 B1
`
`
`I. INTRODUCTION
`
`A. Background
`Mipox Corporation1 (“Petitioner”) filed a Petition (Paper 1, “Pet.”) to
`institute inter partes review of claims 26 and 28 of U.S. Patent
`No. 6,777,966 B1 (Ex. 1001, “the ’966 patent”). International Test
`Solutions, Inc. (“Patent Owner”) filed a Preliminary Response (Paper 7,
`“Prelim. Resp.”).
`Upon consideration of the Petition and Preliminary Response, we are
`persuaded, under 35 U.S.C. § 314(a), that Petitioner has demonstrated a
`reasonable likelihood that it would prevail in showing the unpatentability of
`claims 26 and 28 of the ’966 patent. Accordingly, we institute an inter
`partes review of these claims.
`
`B. Related Matters
`Petitioner identifies the following as a matter that could affect, or be
`affected by, a decision in this proceeding: Int’l Test Solutions, Inc. v. Mipox
`Int’l Corp., Case No. 3:16-cv-00791 (N.D. Cal.). Pet. 1. Patent Owner
`identifies the same matter. Paper 3, 2.
`
`C. Evidence Relied Upon
`
`Reference
`
`Okubo
`
`Angell
`
`Date2
`
`Exhibit
`
`US 2002/0028641 A1 Feb. 16, 1999 Ex. 1006
`
`US 6,019,663
`
`Feb. 20, 1998 Ex. 1007
`
`
`1 Petitioner further identifies Mipox International Corporation and MGN
`International, Inc. as real parties-in-interest. Pet. 1.
`2 All dates refer to the filing date of the respective references.
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`IPR2017-00938
`Patent 6,777,966 B1
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`
`Reference
`
`Yamasaka
`
`Date2
`
`Exhibit
`
`US 5,968,282
`
`Nov. 5, 1998
`
`Ex. 1008
`
`Yamasaka ’104
`
`US 6,130,104
`
`Apr. 6, 1998
`
`Ex. 1009
`
`
`Petitioner also relies on the Declaration of Ira M. Feldman. Ex. 1013.
`
`
`D. The Asserted Grounds of Unpatentability
`Petitioner asserts the following grounds of unpatentability:
`Claims
`Challenged
`26 and 28
`
`Basis
`
`§ 102(e)
`
`Reference(s)
`
`Okubo
`
`Okubo and Angell
`
`Yamasaka and Angell
`
`Yamasaka ’104 and Angell
`
`
`
`§ 103(a)
`
`§ 103(a)
`
`§ 103(a)
`
`26 and 28
`
`26 and 28
`
`26 and 28
`
`II. ANALYSIS
`
`A. The ’966 Patent
`The ’966 patent relates to a cleaning device for cleaning probe
`elements of a probe testing card for testing semiconductor wafers. Ex. 1001,
`Abstract. Figure 4 of the ’966 patent is reproduced below.
`
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`IPR2017-00938
`Patent 6,777,966 B1
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`Figure 4 is a cross-sectional view of a schematic illustration of a cleaning
`device according to the invention described in the ’966 patent. Id. at 4:18–
`19. Cleaning device 20 includes substrate 22 and pad 24 adhered to surface
`25 of substrate 22. Id. at 4:67–5:2.
`Substrate 22 can be any material having sufficient strength to resist
`breaking when probes contact pad 24, including plastic, metal, glass, silicon,
`or ceramic. Ex. 1001, 5:2–7. Preferably, substrate 22 is a semiconductor
`wafer having a flat mirror finish or a slightly abrasive finish capable of
`burnishing the testing probe tips. Id. at 5:7–13. Pad 24 can be any material
`with predetermined properties that contribute to the cleaning of the testing
`probe tips, such as pads with appropriate abrasiveness, density, elasticity, or
`tackiness. Id. at 5:14–18. Pad 24 is preferably made of an elastomeric
`material such as a natural or synthetic rubber or polymer having a
`predetermined elasticity, density, and surface tension that allows the testing
`probe tips to penetrate the elastomeric material and be cleaned by it without
`being damaged. Id. at 5:27–37.
`Cleaning device 20 preferably has the same size and shape as a
`semiconductor wafer undergoing testing, and is placed in a wafer cleaning
`tray. Ex. 1001, 5:60–63. When cleaning of the testing probes is needed, the
`testing apparatus loads cleaning device 20 from the wafer cleaning tray and
`mounts it on the same chuck on which semiconductor wafers undergoing
`testing are mounted. Id. at 6:6–8.
`Petitioner challenges the patentability of independent claims 26 and
`28 of the ’966 patent. Claim 26, which is representative, is reproduced
`below.
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`IPR2017-00938
`Patent 6,777,966 B1
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`
`26. A cleaning device for cleaning the probe
`elements in a semiconductor testing apparatus, the
`cleaning device comprising:
`
`a substrate having a configuration to be introduced
`into the testing apparatus during the normal testing
`operating of the testing apparatus, wherein the
`substrate comprises a semiconductor wafer having
`a surface; and
`
`a pad, secured to the substrate, the pad having
`predetermined characteristics that cause the pad to
`clean debris from the probe elements when the
`probe elements contact the pad so that the probe
`elements are cleaned, without modification or
`damage, during the normal operation of the testing
`machine, wherein the semiconductor wafer surface
`has microroughness which burnishes the probe
`elements.
`
`
`Ex. 1001, 10:23–37. Claim 28 is substantially similar in scope to claim 26,
`but differs in two respects. First, claim 28 does not require the substrate to
`be configured to be introduced into the testing apparatus during normal
`testing operations, but does require the substrate to have a predetermined
`configuration appropriate for particular cleaning probe elements. Compare
`id. at 10:26–29, with id. at 10:56–59. Second, claim 28 does not require the
`cleaning pad to clean the probe elements without modification or damage
`during normal operation of the testing machine. Compare id. at 10:30–37,
`with id. at 10:60–65.
`B. Claim Construction
`The Board interprets claims of an unexpired patent using the broadest
`reasonable interpretation in light of the specification of the patent in which
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`Patent 6,777,966 B1
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`they appear. See 37 C.F.R. § 42.100(b); Cuozzo Speed Techs., LLC v. Lee,
`136 S. Ct. 2131, 2142–46 (2016). Consistent with the rule of broadest
`reasonable interpretation, claim terms are generally given their ordinary and
`customary meaning, as would be understood by one of ordinary skill in the
`art in the context of the entire disclosure. See In re Translogic Tech., Inc.,
`504 F.3d 1249, 1257 (Fed. Cir. 2007).
`Petitioner and Patent Owner agree that “no specific claim
`constructions are necessary” for this proceeding. Pet. 5; Prelim. Resp. 4.
`We agree, and for purposes of this Decision, we find no need to explicitly
`construe any terms in claims 26 and 28.
`C. Anticipation of Claims 26 and 28 by Okubo
`Petitioner argues claims 26 and 28 of the ’966 patent are anticipated
`by Okubo. Pet. 8–20. Patent Owner argues Petitioner fails to demonstrate
`that Okubo discloses a substrate having a microroughness. Prelim. Resp. 7–
`12. Upon review of Petitioner’s arguments and evidence, and Patent
`Owner’s arguments regarding the insufficiency of that evidence, and for the
`reasons discussed below, we determine that Petitioner fails to demonstrate a
`reasonable likelihood of showing claims 26 and 28 are anticipated by
`Okubo.
`1. Overview of Okubo (Ex. 1006)
`Okubo discloses “a probe end cleaning sheet for removing foreign
`matter adhered to the end of a probe.” Ex. 1006 ¶ 2. Figure 1 of Okubo is
`reproduced below.
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`
`Figure 1 is a cross-sectional schematic illustration of cleaning sheet 100 used
`to clean testing probes 211 of a semiconductor testing apparatus known as a
`prober. Id. ¶ 14. Cleaning sheet 100 is a laminated structure formed in the
`same size and shape as a semiconductor wafer undergoing prober testing,
`and comprises cleaning film 110, elastic sheet 120, and board 130. Id. ¶ 38.
`Cleaning film 110 is a fine, abrasive powder made from a material and
`having a granularity that depends upon the size of testing probe 211. Id.
`¶¶ 28–29. Elastic sheet 120 is made from a silicone or urethane rubber
`having an elasticity that allows it to be dented by the load supplied when
`testing probe 211 is lowered onto cleaning sheet 100. Id. ¶¶ 32–34. Board
`130 is made from a sufficiently rigid material that it is free from the effects
`of deformation caused when elastic sheet 120 is dented by testing probe 211.
`Id. ¶ 37. Board 130 can be made, for example, from a metal, ceramic, or
`silicon plate or wafer.3 Id.
`
`
`3 Although Okubo literally discloses board 130 can be made from a silicone
`wafer, we interpret this as a typographical error because Okubo discloses
`elastic sheet 120 can be made from silicone, and board 130 “is required to
`have enough rigidity to be free from effects of deformation of the elastic
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`Okubo discloses loading cleaning sheets 100 at a given rate into a
`
`cassette that holds semiconductor wafers to be tested (e.g., 1 cleaning sheet
`per 20 semiconductor wafers) to automatically clean probe 211 on a periodic
`basis. Ex. 1006 ¶ 40. When probe 211 is cleaned, the prober loads cleaning
`sheet 100 from the wafer cassette, mounts it on a suction table, and
`repeatedly presses probe 211 against cleaning sheet 100. Id. ¶¶ 48–49. This
`removes foreign matter adhered to the end of probe 211 without scraping off
`or wearing down the end of probe 211. Id. ¶ 52. When the cleaning is
`complete, cleaning sheet 100 is removed from the suction table, and a new
`semiconductor wafer is retrieved from the wafer cassette, mounted on the
`suction table, and tested. Id. ¶ 53.
`2. Comparison of Claims 26 and 28 to Okubo
`Claim 26 recites a cleaning device, and requires a semiconductor
`wafer substrate “wherein the semiconductor wafer surface has
`microroughness which burnishes the probe elements.” Ex. 1001, 10:23–29,
`10:35–37. Claim 28 recites a cleaning device that also requires “the
`semiconductor wafer surface has microroughness which burnishes the probe
`elements.” See id. at 10:54–59, 10:64–65.
`Petitioner argues Okubo meets this limitation by disclosing “cleaning
`thin film 110 with abrasive particles and a metal thin film 140 with a
`roughened surface mounted on board 130 (or silicon wafer) that clean or
`polish the probe elements” because Patent Owner, in the underlying district
`
`
`sheet 120.” Ex. 1006 ¶¶ 32, 37. Both Petitioner and Petitioner’s declarant,
`Mr. Feldman, note this typographical error and argue for the interpretation
`we have applied for the same reason we have applied that interpretation. See
`Pet. 12 n.8 (citing Ex. 1013 ¶ 21 n.4).
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`court litigation, contends that a cleaning sheet applied to a wafer or coated
`with abrasive particles and applied to a base material meets the limitation.
`Pet. 14–15 (citing Ex. 1010, App’x A, 3); see also id. at 19 (citing Ex. 1010,
`App’x A, 4) (discussing the same limitation in claim 28). Patent Owner
`argues Petitioner fails to demonstrate claims 26 and 28 are anticipated by
`Okubo because Okubo does not disclose “that board 130 or a surface of the
`board 130 has any microroughness.” Prelim. Resp. 9–10.
`We agree with Patent Owner. Although Okubo discloses board 130
`may be a semiconductor wafer, Petitioner does not demonstrate where
`Okubo discloses the surface of board/semiconductor wafer 130 has
`microroughness to burnish probe elements. Indeed, Petitioner’s expert,
`Mr. Feldman, testifies that semiconductor wafers can have either mirrored or
`roughened surfaces. See Pet. 15 (citing Ex. 1013 ¶ 26).
`Accordingly, on the record before us, and for the reasons discussed
`above, we find Petitioner fails to demonstrate a reasonable likelihood of
`showing claims 26 and 28 are anticipated by Okubo.
`D. Obviousness of Claims 26 and 28 over Okubo and Angell
`Petitioner argues the subject matter of claims 26 and 28 of the ’966
`patent would have been obvious over the combined teachings of Okubo and
`Angell. Pet. 20–36. Patent Owner argues Petitioner fails to demonstrate the
`combination of Okubo and Angell teaches all the limitations required by
`claims 26 and 28, or that it would have been obvious to combine the
`teachings of Okubo and Angell. Prelim. Resp. 12–16. Upon review of
`Petitioner’s arguments and evidence, and Patent Owner’s arguments
`regarding the insufficiency of that evidence, and for the reasons discussed
`below, we are persuaded on this record that Petitioner has demonstrated a
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`reasonable likelihood of showing claims 26 and 28 would have been
`unpatentable as obvious over the combined teachings of Okubo and Angell.
`1. Overview of Angell (Ex. 1007)
`Angell discloses “[a] system and method for cleaning probe pins on a
`probe card used in testing a semiconductor device during fabrication thereof.
`A ceramic cleaning wafer is utilized to clean the probe pins without having
`to remove the probe card from a production line.” Ex. 1007, Abstract. The
`same apparatus that is used to test production wafers “also handles the
`cleaning wafer during a probe cleaning cycle.” Id. The cleaning wafer can
`be made “of any abrasive material that has a suitable grain size for cleaning
`the probe pins,” including silicon carbide, a semiconducting material. Id. at
`3:34–41. “The rough surface on the wafer acts as an abrasive to clean off
`the probe pin tips.” Id. at 3:36–37. Angell also teaches the cleaning wafer
`can be formed in the shape of a flat, circular disk, where both sides of the
`wafer are abrasive. Id. at 47–49.
`2. Comparison of Claims 26 and 28 to the Combined Teachings of
`Okubo and Angell
`Claim 26 recites a cleaning device, and requires a semiconductor
`wafer substrate configured to be introduced into the testing apparatus during
`the normal testing operation of the testing apparatus. Ex. 1001, 10:23–29.
`Petitioner demonstrates a reasonable likelihood of showing Okubo teaches
`this limitation. See Pet. 24–26 (citing Ex. 1006 ¶¶ 27, 37, 39–40, 48–49,
`Fig. 1).
`In particular, Petitioner points to Okubo’s disclosure of laminated
`cleaning sheet 100 comprising cleaning film 110, elastic sheet 120, and
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`Patent 6,777,966 B1
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`board 130, which can be a silicon wafer.4 Pet. 24; see Ex. 1006 ¶¶ 27, 37.
`Petitioner further notes that Okubo discloses cleaning sheet 100 can have the
`same size and shape as the semiconductor wafers tested by prober 200, and
`can be loaded into a cassette together with the semiconductor wafers at a
`fixed rate so that testing probe 211 can be automatically cleaned on a
`periodic basis. Pet. 25 (citing Ex. 1006 ¶¶ 39–40, 48–49).
`Patent Owner argues Okubo fails to disclose a substrate because
`Petitioner identifies the cleaning pad required by claim 26 as cleaning film
`110, elastic sheet 120, and board 130. Prelim. Resp. 9, 13 (citing Pet. 13).
`We are not persuaded by Patent Owner’s argument on this record. First, the
`argument is based on a statement Petitioner made in support of its contention
`that the subject matter of claim 26 is anticipated by Okubo, rather than its
`contention that the subject matter of claim 26 would have been obvious over
`the combined teachings of Okubo and Angell. See Pet. 8–20. In its
`contention that the subject matter of claim 26 would have been obvious over
`Okubo and Angell, Petitioner states “Okubo teaches a cleaning device (the
`probe end cleaning sheet 100) with a substrate (the board 130 or silicon
`wafer).” Id. at 24. Second, Petitioner made the identical statement mapping
`board 130 to the required substrate in its contention that claim 26 is
`anticipated by Okubo. See id. at 10. Although Petitioner does refer to board
`130 when mapping Okubo to the pad required by claim 26, Petitioner does
`so because the full limitation requires the pad to be secured to a substrate,
`and Petitioner refers to board 130 to demonstrate the pad is “secured to a
`
`
`4 See supra note 3.
`
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`substrate.” See id. at 13 (“Okubo teaches a pad, secured to the substrate
`(e.g., board 130 or silicon wafer) . . . .”).
`Claim 26 further requires the surface of the semiconductor wafer to
`have a microroughness capable of burnishing the probe elements. Ex. 1001,
`10:35–37. Petitioner demonstrates a reasonable likelihood of showing
`Angell teaches a cleaning device that includes a semiconductor substrate
`having an abrasive surface with a microroughness to clean and burnish the
`probe tips. Pet. 29–30 (citing Ex. 1007, 3:34–49). In that regard, Petitioner
`contends that Angell discloses a cleaning wafer to clean probe pins on a
`probe card in a production setting. Id. at 26 (citing Ex. 1007, 3:17–27.
`Petitioner further contends that Angell’s cleaning wafer can be made of any
`abrasive material having a suitable grain size to clean the probe pins,
`including silicon carbide, a semiconducting material. Id. at 29–30 (citing
`Ex. 1007, 3:34–46).
`Relying on the testimony of Mr. Feldman, Petitioner argues a person
`of ordinary skill in the art would have understood from these teachings that
`Okubo’s semiconductor substrate could have been textured to have the
`abrasive surface of Angell’s cleaning wafer or could have simply been
`replaced with Angell’s cleaning wafer in order to have surface
`microroughness that burnishes the probe elements. Pet. 30 (citing Ex. 1013
`¶ 51). Petitioner, further relying on the testimony of Mr. Feldman, argues
`the proposed combination of Okubo and Angell would have been a simple
`combination or substitution of known elements, with each element
`performing its known function to achieve a predictable result, and that a
`person skilled in the art would have made the combination to more
`efficiently clean the probe elements and to improve adhesion between the
`
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`IPR2017-00938
`Patent 6,777,966 B1
`
`substrate and cleaning layers of Okubo. Id. at 22–23 (citing Ex. 1013 ¶¶ 38–
`40).
`Patent Owner argues Petitioner’s reasons for combining Okubo and
`Angell are conclusory, and that the teachings of Okubo and Angell teach
`away from the combination. Prelim. Resp. 14–16. Relying on the testimony
`of its declarant, Dr. Joseph Bernstein, Patent Owner argues that Angell’s
`cleaning device is a single ceramic substrate and Okubo’s cleaning device is
`a multi-layered device that is dented during the cleaning process, and “[i]f
`Angell’s single ceramic layer were placed on Okubo’s system, the ceramic
`layer would not get dented, and would not clean as Okubo teaches.” Id. at
`15 (citing Ex. 2001 ¶ 62). We are not persuaded, on this record, by Patent
`Owner’s arguments.
`Petitioner, relying on the testimony of Mr. Feldman, argues the reason
`for combining Okubo and Angell is to more efficiently clean the probe
`elements and to improve adhesion between Okubo’s substrate and cleaning
`layers. See Pet. 22–23 (citing Ex. 1013 ¶¶ 38–40). We do not find this
`reasoning conclusory, as the prior art confirms Mr. Feldman’s opinion that a
`semiconductor substrate having a roughened surface improves adhesion
`between the substrate and an elastic cleaning layer such as Okubo’s. See Ex.
`1009, 9:62–66. Moreover, Petitioner’s proposed combination is to either
`roughen the surface of Okubo’s semiconductor substrate or to replace it with
`Angell’s roughened semiconductor substrate. See Pet. 30 (citing Ex. 1013
`¶ 51). This would allow testing probe 211 to continue to penetrate and dent
`Okubo’s cleaning film 110 and elastic layer 120, which would be placed
`over the surface of Okubo’s roughened or replaced semiconductor substrate
`130. See Ex. 1006 ¶ 27, Fig. 1.
`
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`
`Claim 26 further requires a pad, secured to the substrate, having
`predetermined characteristics that cause the pad to clean debris from the
`probe elements when the probe elements contact the pad without modifying
`or damaging the probe elements during the normal operation of the testing
`machine. Ex. 1001, 10:30–35. Petitioner demonstrates a reasonable
`likelihood of showing Okubo teaches this limitation. See Pet. 26–28 (citing
`Ex. 1006 ¶¶ 9–11, 38–40, 48–52, 60–63, Figs. 1–2).
`Petitioner points to Okubo’s teaching of “a probe end cleaning sheet
`capable of removing foreign matter without deforming the end of the probe.”
`Pet. 27 (citing Ex. 1006 ¶¶ 9–11, 52). The cleaning sheet is a laminated
`structure that includes a cleaning film 110 and elastic sheet 120 (which
`Petitioner identifies as the pad), secured to a board 130 (which Petitioner
`identifies as the semiconductor substrate). Ex. 1006 ¶ 38. The cleaning
`sheet is loaded in a cassette together with semiconductor wafers to be tested
`in a prober so that the testing probe can be automatically cleaned at a
`periodic rate. Id. ¶¶ 39–40, 48–52. The cleaning film 110 is made of a fine
`abrasive powder that is chosen based on the material and size of testing
`probe 211, and the elastic sheet 120 is made sufficiently pliable so that when
`testing probe 211 is lowered unto the cleaning sheet it is “wrapped in the
`cleaning thin film 120 [sic, 110] by the dent in the elastic sheet 120,” so that
`“the end of the probe 211 is not scraped off at all.” Id. ¶¶ 29, 50–52, 60–61.
`Claim 28 recites a cleaning device that is substantially similar in
`scope to claim 26. Compare Ex. 1001, 10:23–37, with 10:54–65. Claim 28
`does not require the substrate to be configured to be introduced into the
`testing apparatus during normal testing operations, and does not require the
`cleaning pad to clean the probe elements without modification or damage
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`during normal operation of the testing machine. Id. Claim 28, however,
`does require the substrate to have a predetermined configuration appropriate
`for particular cleaning probe elements. Id. at 10:56–57.
`Petitioner provides the same analysis, discussed above, to demonstrate
`a reasonable likelihood of showing the combination of Okubo and Angell
`teaches all of the limitations that are common to claims 26 and 28. Pet. 33–
`36. Petitioner further argues Okubo teaches a substrate having a
`predetermined configuration appropriate for particular cleaning probe
`elements by disclosing a round and substantially planar substrate having a
`thickness that can be used to clean vertical or cantilevered probe elements.
`Id. at 31–32 (citing Ex. 1006 ¶¶ 39, 40, 59, Figs. 1, 6A–C).
`Patent Owner argues Petitioner fails to demonstrate a reasonable
`likelihood of showing claim 28 would have been obvious over the
`combination of Okubo and Angell for the same reasons as claim 26. See
`Prelim. Resp. 12–16. For the reasons discussed above, we do not find Patent
`Owner’s arguments to be persuasive on this record.
`Accordingly, on the record before us, having considered Petitioner’s
`arguments and evidence, and Patent Owner’s arguments regarding the
`insufficiency of that evidence, we find Petitioner has demonstrated a
`reasonable likelihood of showing claims 26 and 28 would have been
`unpatentable over the combination of Okubo and Angell.
`E. Obviousness of Claims 26 and 28 over Yamasaka and Angell
`Petitioner argues claims 26 and 28 of the ’966 patent would have been
`unpatentable as obvious over the combined teachings of Yamasaka and
`Angell. Pet. 36–49. Patent Owner argues Petitioner fails to demonstrate the
`obviousness of these claims over these references. Prelim. Resp. 16–21.
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`Upon review of Petitioner’s arguments and evidence, and Patent Owner’s
`arguments regarding the insufficiency of that evidence, and for the reasons
`discussed below, we are persuaded that Petitioner has failed to demonstrate a
`reasonable likelihood of showing claims 26 and 28 would have been obvious
`over Yamasaka and Angell.
`1. Overview of Yamasaka (Ex. 1008)
`Yamasaka discloses
`[a] cleaning mechanism and method for cleaning the probe
`needles of a probe card used for the inspection of the electric
`characteristics of a Wafer W. This mechanism is provided with
`a soft cleaner and a brush cleaner. The soft cleaner has a cleaner
`layer formed of rubber and inorganic filler.
`Ex. 1008, Abstract. Figure 1 of Yamasaka is reproduced below.
`
`
`Figure 1 is a partially-cutaway perspective view of a cleaning apparatus and
`mechanism according to Yamasaka’s invention. Id. at 3:33–35. Figure 1
`discloses prober 10 provided with loader chamber 11 through which wafers
`W to be tested are loaded from cassette C. Id. at 4:1–4. Prober 10 includes
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`main chuck 19 for testing wafers W, and cleaning mechanism 30 consisting
`of soft cleaner 31 provided at one position and brush cleaners 32/33
`provided at second and third positions. Id. at 4:41–44. A more detailed
`view of cleaning mechanism 30 is provided in Figure 2, which is reproduced
`below.
`
`
`
`Figure 2 is a cross-sectional view of Yamasaka’s cleaning mechanism 30.
`Id. at 3:36–38. Cleaning mechanism 30 includes support base 34 for
`supporting soft cleaner 31 and brush cleaners 32/33 as one body, air cylinder
`35, rod 35A, and base 36. Id. at 4:45–48. Soft cleaner 31 includes soft
`cleaner layer 31A supported by container 31B having projection 31C into
`support base 34. Id. at 5:3–8. Cleaning layer 31A is made from a natural or
`synthetic rubber (e.g., silicone) having an inorganic filler of grinding
`particles such as silica sand, glass, alumina, or ceramic particles. Id. at 5:8–
`14. During a cleaning operation, soft cleaner 31 and brush cleaners 32/33
`are alternately raised to contact probe needles 21A to remove debris that has
`adhered to probe needles 21A. Id. at 5:61–7:12.
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`
`2. Comparison of Claims 26 and 28 to the Combined Teachings of
`Yamasaka and Angell
`Claim 26 recites a cleaning device that requires a substrate having a
`configuration to be introduced into the testing apparatus during the normal
`testing operation of the testing apparatus. Ex. 1001, 10:23–28.
`Petitioner argues Yamasaka teaches this limitation by disclosing “a
`cleaning mechanism 30 with a substrate (e.g., container section 31B and/or
`projection 31C) that is included within the test apparatus and thus used in the
`normal testing operating procedure.” Pet. 40–41 (citing Ex. 1008, 5:3–41,
`5:62–6:65, 7:13–26, Fig. 2). Petitioner thus argues that any testing apparatus
`having a cleaning device with a substrate “included” in the testing apparatus
`has a cleaning device with “a substrate having a configuration to be
`introduced into the testing apparatus” as required by claim 26. Id. at 40.
`Petitioner further argues that “Angell also teaches this element.” Id. at 41
`(citing Ex. 1007, 1:62–2:4, 3:25–27).
`Relying on the testimony of Mr. Feldman, Petitioner also argues a
`person having ordinary skill in the art would have found it obvious to
`combine the teachings of Yamasaka and Angell “by simply placing the
`cleaning layers of Yamasaka on the cleaning surrogate wafer substrate of
`Angell and using it on the main chuck of a testing apparatus,” or by
`replacing “the prior art substrate of Yamasaka with the semiconductor
`cleaning wafer with microroughness of Angell to more efficiently clean
`probe elements.” Pet. 38–39 (internal citations omitted) (citing Ex. 1013
`¶¶ 64–65). Petitioner further argues a person of ordinary skill in the art
`would have found this combination obvious because it “would produce a
`commercial advantage in that the cleaning methods and apparatuses
`
`18
`
`

`

`IPR2017-00938
`Patent 6,777,966 B1
`
`disclosed in Yamasaka could use the cleaning semiconductor wafer of
`Angell to more quickly and efficiently clean the probe pins.” Id. at 37
`(internal citations omitted) (citing Ex. 1013 ¶ 63).
`Patent Owner, relying on the testimony of Dr. Bernstein, argues
`“[t]here is no motivation to combine Yamasaka and Angell, and one of
`ordinary skill in the art would not have a reasonable expectation of success
`in doing so.” Prelim. Resp. 20 (citing Ex. 2001 ¶¶ 70–73). Patent Owner
`further argues Yamasaka teaches separate cleaning mechanisms that are
`located aside a chuck in a testing machine, Angell teaches a single layer
`ceramic wafer that is loaded as if it were a semiconductor wafer for testing,
`and “[i]t would not make sense . . . to attempt to combine two completely
`different components, one [of] which is fastened to a testing machine, and
`another [of] which is a separate wafer, into one product.” Id.
`We are persuaded by Patent Owner’s argument. As Patent Owner
`points out, Yamasaka’s cleaning mechanism is “located [within] the
`cleaning machine itself, to the side of the ‘main chuck 19’ where the wafer
`W is loaded.” Prelim. Resp. 17. Thus, container section 31B or projection
`31C of Yamasaka’s soft cleaner 31, which Petitioner identifies as the
`“substrate” required by claim 26, does not have “a configuration to be
`introduced into the testing apparatus” as also required by claim 26.
`Petitioner’s argument for combining Yamasaka and Angell by placing
`Yamasaka’s cleaning layers on Angell’s substrate and using it on the main
`chuck of the testing apparatus, or by simply replacing Yamasaka’s substrate
`with Angell’s cleaning wafer, fails to explain how the combination would
`result in “a substrate having a configuration to be introduced into the testing
`apparatus” as required by claim 26. (emphasis added).
`
`19
`
`

`

`IPR2017-00938
`Patent 6,777,966 B1
`
`
`Although claim 28 does not require a substrate configured to be
`introduced into the testing apparatus, Petitioner relies on the same rationale
`for combining the teachings of Yamasaka and Angell for the purpose of
`demonstrating the unpatentability of both claim 26 and claim 28. See Pet.
`36–39. We find this rationale unpersuasive for the reasons discussed above.
`Accordingly, on the record before us, we find Petitioner fails to
`demonstrate a reasonable likelihood of showing claims 26 and 28 would
`have been obvious over the combination of Yamasaka and Angell.
`F. Obviousness of Claims 26 and 28 over Yamasaka ’104 and Angell
`Petitioner alleges claims 26 and 28 of the ’966 patent would have
`been unpatentable as obvious over the combined teachings of Yamasaka
`’104 and Angell. Pet. 49–63. Patent Owner argues Petitioner fails to
`demonstrate the obviousness of these claims over these references. Prelim.
`Resp. 21–23. Upon review of Petitioner’s arguments and evidence, and
`Patent Owner’s arguments regarding the insufficiency of that evidence, and
`for the reasons discussed below, we are persuaded that Petitioner has
`demonstrated a reasonable likelihood of showing claims 26 and 28 would
`have been unpatentable as obvious over the combined teachings of
`Yamasaka ’104 and Angell.
`1. Overview of Yamasaka ’104 (Ex. 1009)
`Yamasaka ’104 discloses “a cleaner for inspecting projections [that]
`removes any substance, e.g., aluminum oxide, which attaches to needle
`points of probe needles, when the probe needles pierce into the cleaner. The
`cleaner has a cleaner layer and a substrate.” Ex. 1009, Abstract. The
`cleaner is disclosed in Figure 1B of Yamasaka ’104, which is reproduced
`below.
`
`20
`
`

`

`IPR2017-00938
`Patent 6,777,966 B1
`
`
`
`Figure 1B is a cross-sectional schematic illustration of probe needle 17A
`piercing cleaning layer 4 of cleaning device 1 for cleaning the probe needle.
`Id. at 6:46–47. Cleaning layer 4 is made from an organic or inorganic
`rubber (e.g., silicone) embedded with an abrasive filler such as sand, glass,
`or alumina. Id. at 7:9–32. The particle size of the abrasive filler is large
`enough to remove unwanted material from probe needle 17A, yet small
`enough to avoid damaging the point of probe needle 17A. Id. at 7:32–38.
`Substrate 5 is made from a material to which cleaning layer 4 readily
`adheres, such as a silicon substrate. Id. at 7:38–43. Silicon substrate 5 can
`have a roughened surface to improve the adhesion of cleaning layer 4, and
`can be either integrated with the main chuck of the prober/tester or freely
`removabl

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