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`Low temperature formation of emitter and BSF by rapid thermal co-diffusion of P, Al or B | IEEE Conference Publication | IEEE Xplore
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`Conferences > Proceedings of 1994 IEEE 1st ...
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`Low temperature formation of emitter and BSF by rapid thermal co-diffusion of P,
`Al or B
`Publisher: IEEE
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`B. Hartiti ; S. Sivoththaman ; R. Schindler ; J. Nijs ; J.C. Muller ; P. Siffert All Authors
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`Abstract:
`Rapid thermal processing (RTP) is now emerging as a promising simplified process for manufacturing of terrestrial
`solar cells in a continuous way. In earlier works, we ha... View more
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`Abstract:
`Rapid thermal processing (RTP) is now emerging as a promising simplified process for manufacturing of terrestrial
`solar cells in a continuous way. In earlier works, we have shown that RTP can advantageously replace the classical
`furnace for performing emitter, BSF and surface passivation in addition to an efficient gettering of metallic impurities
`during these steps. In this work, we present results about co-diffusion of two dopant elements in a single rapid thermal
`cycle at low temperature in order to form emitter and BSF simultaneously. We have, in particular, found that the
`diffusion kinetics of dopant elements are enhanced during rapid thermal co-diffusion of P, Al or B and lead to the
`optimal dopant activity and profile for high efficiency silicon solar cells at low temperature. Additionally, the gettering
`effect induced by the co-diffusion of P and Al is more efficient than can be achieved by a single diffusion of these two
`elements. Finally, test solar cells were performed on these structures and gave, for a low processing temperature
`(800/spl deg/C/60 s), an efficiency of 11% on polished FZ monocrystalline substrates without antireflecting coating.
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`Published in: Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint
`Conference of PVSC, PVSEC and PSEC)
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`https://ieeexplore.ieee.org/document/520502
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`Petitioner Canadian Solar Inc. - Ex. 1053, p. 1
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`6/22/24, 2:38 PM
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`Low temperature formation of emitter and BSF by rapid thermal co-diffusion of P, Al or B | IEEE Conference Publication | IEEE Xplore
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`Date of Conference: 05-09 December 1994
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`DOI: 10.1109/WCPEC.1994.520502
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`Date Added to IEEE Xplore: 06 August 2002
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`Publisher: IEEE
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`Print ISBN:0-7803-1460-3
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`Conference Location: Waikoloa, HI, USA
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`Rapid thermal processing: a comprehensive classification of silicon materials
`Conference Record of the Twenty-Ninth IEEE Photovoltaic Specialists Conference, 2002.
`Published: 2002
`
`Passivation Effects on Low-Temperature Gettering in Multicrystalline Silicon
`IEEE Journal of Photovoltaics
`Published: 2017
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`https://ieeexplore.ieee.org/document/520502
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`Petitioner Canadian Solar Inc. - Ex. 1053, p. 2
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`6/22/24, 2:38 PM
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`Low temperature formation of emitter and BSF by rapid thermal co-diffusion of P, Al or B | IEEE Conference Publication | IEEE Xplore
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