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A HIGH FREQUENCY PLASMA PROCESS WHEREIN THE PLASMA IS EXECUTED BY AN INDUCTIVE STRUCTURE IN WHICH THE PHASE AND ANTI-PHASE PORTION OF THE CAPACITATIVE CURRENTS BETWEEN THE INDUCTIVE STRUCTURE AND THE PLASMA A RE BALANCED

08/739,037 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Oct. 28, 1996
Examiner THI D DANG
Class 216
Art Group 1763
Patent No. 5,965,034
Case Type Utility - 216/068000
Status Patented Case
Parent 08/567,224 Abandoned
Last Updated: 4 years, 7 months ago
Date # Transaction