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METHOD OF STRUCTURING A PHOTORESIST LAYER

09/999,323 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Oct. 31, 2001
Examiner DABORAH CHACKO DAVIS
Class 430
Art Group 1756
Patent No. 6,746,821
Case Type Utility - 430/311000
Status Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
Child 100 54 121.6
Child 101 20 659.3
Last Updated: 4 years, 10 months ago
Date # Transaction