`
`.
`
`par/17'?
`
`Z&P-]ZNFP10443
`
`o ocket No.:
`
` v?"
`
`I hereby certify that this correspondence is being deposited with the United States Postal Service with sufficient postage as
`First Class Mail in an envelope addressed to the Commissioner for Patents, PO. Box 1450, Alexandria, VA 22313-1450, on
`the date indicated
`
` Date: August 6, 2004
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`Patent No.
`
`Issue Date
`
`Patentees
`
`Title
`
`:
`
`:
`
`:
`
`:
`
`6,746,827 B2
`
`June 8, 2004
`
`Ernst—Christian Richter et a1.
`
`Process for Structuring a Photoresist Layer
`
`Customer No.:
`
`24131
`
`Hon. Commissioner for Patents
`
`Alexandria, VA 22313-1450
`
`INFORMATION DISCLOSURE STATEMENT
`UNDER 37 C.F.R. 1.501
`
`S i r :
`
`In accordance with 37 C.F.R. 1.501, copies of the following patents are cited herewith.
`
`l)
`
`. US. Patent No. 5,206,117 (Labadie et al.), dated April 27, 1993.
`
`The polymer system described therein is a so-called polyamic alkyl ester, which under the
`
`influence of a base undergoes a crosslinking reaction via imidazation (see column 4, lines 10
`
`to 26). The carbonic acid ester group COOR' of the general repeat unit of this polymer is
`
`supposed to be selected in such a way that it does not interfere with the imidazation or the
`
`properties of the final polyimide. Therefore, these ester groups will be relatively stable and
`
`cannot be easily cleaved off under the influence of an acid in a photoresist layer.
`
`Most importantly, the polymeric system used therein achieves the modification of the
`
`solubility of the final polymer via a crosslinking reaction. Such crosslinking is said to lead to
`
`the formation of a three-dimensional network polymer, thereby leading to "rough", i.e.
`
`
`
`Patent No. 6,746,827 B2
`IDS dated 8/6/04
`
`imprecisely defined-frayed, for example - profile sidewalls.
`
`A further difference between the present invention and US. Patent No. 5,206,117 is that the
`
`film-forming polymer is rendered soluble in alkaline solutions in step c) and d) in claim 1 in
`
`the above-identified invention, which development is carried out in an alkaline solution.
`
`2)
`
`German Published, Non-Prosecuted Patent Application No. DE 100 54 121 A1
`
`(Sebald et al.), dated May 16, 2002, corresponding to US. Patent No. 6,746,821 B2.
`
`This reference solely pertains to features cited in the dependent claims of the above-identified
`
`patent.
`
`For the above-outlined reasons, it is believed that the enclosed prior art is less pertinent than
`
`the prior art previously submitted or cited by the Examiner.
`
`It is respectfully requested that
`
`the references merely be placed in the PTO file.
`
`REG. NO. 29,308
`
`LAURENCE A. GREENBERG
`
`Date: August 6, 2004
`
`Lerner And Greenberg, P.A.
`Post Office Box 2480
`
`Hollywood, FL 33022-2480
`Tel:
`(954) 925-1100
`Fax:
`(954) 925-1101
`/bb
`
`
`
`
` RM PTO-1449 (SUBSTITUTE)
`Attorney Docket No.:
`Patent No.
`firm “a”.
`Z&P—INFP10443
`6,746,827 B2
`
`us. DEPARTMENT OF COMMERCE
`PATENT AND TRADEMARK OFFICE
`Patentee
`
`
`INFORMATION DISCLOSURE
`Ernst-Chnstlan Richter et al.
`
`STATEMENT BY APPLICANT
`(37 CFR 1.98(b))
`
`
`
`
`Issue Date
`June 8, 2004
`
`.
`Group Art Unit
`1756
`
`U.S. PATENT DOCUMENTS
`
`EXAMINER
`INITIALS
`
`SUB
`CLASS
`
`FILING
`DATE
`
`>
`
`5,206,1 17
`
`04/93
`
`Labadie et a1.
`
`
`
`
`
`
`
`
`
`FOREIGN PATENT DOCUMENT
`
`DOCUMENT NO.
`
`DATE
`
`COUNTRY
`
`CLASS
`
`DE 100 54 121 A]
`
`05/02
`
`SUB
`CLASS
`
`TRANSL.
`YEs NO
`
`OTHER DOCUMENTS (Including Author, Title, Date, Pertinent Pages, etc.)
`
`EXAMINER
`
`DATE CONSIDERED
`
`EXAMINER: Initial if citation considered, Whether or not citation is in conformance with MPEP 609; Draw
`line through citation if not in conformance and not considered. Include copy of this form with next
`communication to a. .1icant.
`
`
`
`
`
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