`t9
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`“1 1Wer§b certify that this correspondenceIs being deposited with the United States Postal Service with sufficient
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`post; .- as F‘ ;
`.53 Mail in an enve . ,2 addressed to the Commissioner for Patents P. O. Box 1450
`
`
`x’
`
`T'AND TRADEMARK OFFICE
`’ UNITED STATES PAT
`
`Date: December 3, 2004
`
`RECEIVED
`DEC 1 3 2004
`TC 1700
`
`Eztggtefio-
`Titslleed
`
`Docket No.
`Customer No.
`
`'
`
`:
`
`:
`:
`
`gimjé-‘Céggstlan RIchter et al.
`nggeasszfgggtructuring a Photoresist Layer
`
`Z&P-INFP10443
`24131
`
`INFORMATION DISCLOSURE STATEMENT
`
`UNDER 37 C.F.R. 1.501
`
`Hon. Commissioner for Patents
`
`Sir:
`
`In accordance with 37 C.F.R. 1.501 copies of the following patents and/or
`
`publications are submitted herewith:
`
`United States Patent No. 5,234,793 (Sebald et al.), dated August 10, 1993.
`
`This document relates to a photolithographic method for a dimensionally accurate
`
`photolithographic transfer of sub-um structures in a bilayer technique.
`
`the method
`
`includes the steps of applying a photolithographically structurable second resist
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`layer, which includes anhydride groups as reactive groups, onto a first planarizing
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`resist layer, exposing and developing the second resist layer in desired regions for
`
`generating a structure, and subjecting the resultant structure so produced to a
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`chemical treatment with a bulging agent, which causes a bulging of the resist
`
`structures by reacting with the reactive groups in the second layer (see, for instance,
`
`claim 1). By this method, the critical dimension which is achievable with the
`
`photolithographic method may be further reduced.
`
`This prior art document does not disclose the combined use of a photoacid generator
`and a thermobase generator in a photoresist layer or the specific sequence of
`
`
`
`method steps of independent claim 1 of the instant US. patent. We are, therefore,
`of the opinion that the newly introduced prior art document is only relevant regarding
`dependent claim 25, which states that the film-forming polymer includes one of
`anhydride structures and succinic anhydride structures.
`
`For the above-outlined reasons, it is believed that the enclosed prior art is less
`pertinent than the prior art previously submitted or cited by the Examiner. Kindly
`place the references in the Patent Office file wrapper.
`
`ully submitted,
`
`
`
`Date: December 3, 2004
`
`Lerner And Greenberg, P.A.
`Post Office Box 2480
`Hollywood, FL 33022-2480
`Tel: (954) 925-1100
`Fax: (954) 925-1101
`
`/bmb
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`SUB
`CLASS
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`FILING
`DATE
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`SUB
`CLASS
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`TRANSL.
`YES NO
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`
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` FORM PTO-1449 (SUBSTITUTE)
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`
`
`
`
`Sheet 1 of 1
`
`
`
`Patent No.
`Attorney Docket No.:
`6,746,827
`Z&P—INFP10443
`
`US. DEPARTMENT OF COMMERCE
`PATENTANDTRADEMARKOFHCE
`Patentee
`
`
`Ernst-Christian Richter et al. \ P E NFORMATION DISCLOSURE
`
`
`I
`V ATEMENT BY APPLICANT
`
` Issued
`June 8, 2004
`REIT EIVED
`
`
`
`
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`
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`
`
`
`
`Initial if citation considered, whether or not citation is in conformance with MPEP 609;
`EXAMINER:
`Draw line through citation if not in conformance and not considered.
`IncIude copy of this form with
`
`next communication to an Iicant.
`
`
`
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