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Inventors

Ernst-Christian Richter Michael Sebald

Assignee

INFINEON TECHNOLOGIES AG

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INFINEON TECHNOLOGIES AG, Assignor POLARIS INNOVATIONS LIMITED, Assignor QIMONDA AG, Assignor

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METHOD FOR STRUCTURING A PHOTORESIST LAYER

10/134,146 | U.S. Patent Application

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Location ELECTRONIC

Filed April 29, 2002

Examiner DABORAH CHACKO DAVIS

Class 430

Art Group 1756

Patent No. 6,887,653

Case Type Utility - 430/322000

Status Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362

Child 101 20 674.7

Last Updated: 5 years, 5 months ago

Date	#	Transaction
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METHOD FOR STRUCTURING A PHOTORESIST LAYER

10/134,146 | U.S. Patent Application

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