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Christoph Noelscher

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INFINEON TECHNOLOGIES AG

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POLARIS INNOVATIONS LIMITED, Assignor QIMONDA AG, Assignor

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PHOTOLITHOGRAPHY MASK AND METHOD OF FABRICATING A PHOTOLITHOGRAPHY MASK

10/295,735 | U.S. Patent Application

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Location ELECTRONIC

Filed Nov. 15, 2002

Examiner SALEHA R MOHAMEDULLA

Class 430

Art Group 1756

Patent No. 7,011,909

Case Type Utility - 430/005000

Status Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362

Child 101 56 143.1

Last Updated: 5 years, 2 months ago

Date	#	Transaction
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PHOTOLITHOGRAPHY MASK AND METHOD OF FABRICATING A PHOTOLITHOGRAPHY MASK

10/295,735 | U.S. Patent Application

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