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SUSCEPTORLESS REACTOR FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION

10/304,646 | U.S. Patent Application

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Location ELECTRONIC
Filed Nov. 26, 2002
Examiner FELISA CARLA HITESHEW
Class 117
Art Group 1765
Patent No. 6,726,769
Case Type Utility - 117/200000
Status Patented Case
Parent 09/778,265 Patented
Parent 10/268,464 Patented
Last Updated: 5 years, 10 months ago
Date # Transaction