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PROCESS FOR FORMING REFRACTORY METAL SILICIDE LAYERS OF DIFFERENT THICKNESSES IN AN INTEGRATED CIRCUIT

07/567,992 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Aug. 16, 1990
Examiner TUAN N QUACH
Class 999
Art Group 1104
Patent No. 5,034,348
Case Type Utility - 999/200000
Status Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
Last Updated: 4 years, 11 months ago
Date # Transaction