Filed July 3, 2024

Serial No. 98632652

Examining Attorney TINA HSIN MAI

Class Machines and machine tools for the assembly and packaging of electronic chips and structural parts and fittings therefor; machines for manufacturing semiconductors, and structural parts and fittings therefor; semiconductor manufacturing machines; semiconductor manufacturing machines and systems composed of a vacuum chamber for accommodating semiconductor wafers and structural parts and fittings therefor; structural parts and machines for handling and transferring semiconductor wafers into and out of vacuum chambers, and structural parts and fittings therefor; machines and machine tools for the treatment of semiconductor wafers, namely, thermal treatment reactors and chemical vapor deposition reactors, chemical reactors for the thermal treatment of semiconductor wafers; machines for the plasma assisted manufacture of semiconductors, namely, vacuum treatment machines for plasma assisted deposition, and vacuum machines for depositing fine films; plasma enhanced deposition machines, namely, semiconductor manufacturing machines utilizing plasma-enhanced deposition, and structural parts and fittings therefor; industrial surface treatment equipment, namely, vacuum plasma treatment systems comprised of a high frequency, high voltage generator, controls, and treatment chamber, and structural fittings and parts therefor; semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of plasma, namely, gas discharge industrial chemical reactors, and structural parts and fittings therefor; industrial robots for the handling of semiconductor wafers; industrial gas-phase reactors for processing semiconductor wafers, namely, chemical reactors for the thermal treatment of semiconductor wafers and reactors for chemical vapor deposition for depositing thin films on semiconductor wafers; industrial gas-phase semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of gas discharge; and structural and replacement parts for the aforementioned products; 013; 019; 021; 023; 024; 031; 034; 035; 021; 023; 026; 036; 038

Case Type Trademark